http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7244544-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5ddadb999be4f451dfc44d8e359d8f6a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C249-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-63 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2005-10-27^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-07-17^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_47da9bc514fceac0d8580fe3c860d169 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad121e2dc3047f6d5102e3c4b452b71d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_72a5bd935c77ba5cce4353e9de95c5cc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_656c0b5202442bc238f80cc5afc4989f |
| publicationDate | 2007-07-17^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-7244544-B2 |
| titleOfInvention | Oxime derivatives and the use thereof as latent acids |
| abstract | New oxime sulfonate compounds of the formula I, II, III, IV, V, VI and VII n nR 1 is for example C 1 –C 18 alkylsulfonyl, R 2 is halogen or C 1 –C 10 haloalkyl; R 3 is for example unsubstitude or substituted phenylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl; Ar 1 is for example a direct bond, C 1 –C 12 alkylene; —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; A 1 , A 2 , A 3 , A 4 , A 5 , A 6 , A 7 , A 8 , A 9 , A 10 , A 11 and A 12 are for example a direct bond, —O—, or —S—, or are C 1 –C 12 alkylene or phenylene unsubstituted or substituted; Y 1 is C 1 –C 12 alkylene which is for example substituted by OR 4 , or SR 7 ; Y 2 is e.g. a trivalent radical of C 1 –C 12 alkylene; Y 3 is e.g. a tetravalent radical of C 1 –C 12 alkylene; X is halogen; Ar′ 1 is for example C 1 –C 12 alkyl which is unsubstituted or substituted; Ar″ 1 is for example phenylene; provided that at least one of the radicals Ar′ 1 , Ar″ 1 , is substituted by 1 to 3 groups ofn n nexample halogen; R 15 , R 16 , R 17 and R 18 e.g. hydrogen or phenyl; R 19 , R 20 , R 21 , R 22 R 23 are e.g. phenyl; are especially suitable for the preparation of photoresists. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7494760-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010026061-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007287096-A1 |
| priorityDate | 2000-09-25^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
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