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filingDate 2005-09-19^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2007-11-13^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-7294871-B2
titleOfInvention Top layers of metal for high performance IC's
abstract A method of closely interconnecting integrated circuits contained within a semiconductor wafer to electrical circuits surrounding the semiconductor wafer. Electrical interconnects are held to a minimum in length by making efficient use of polyimide or polymer as an inter-metal dielectric thus enabling the integration of very small integrated circuits within a larger circuit environment at a minimum cost in electrical circuit performance.
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