http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7393795-B2
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3105 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
filingDate | 2006-02-01^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2008-07-01^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f5d665bd41f0077b9a7096ef836b9521 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4149d924e371982354fed77ef7e6762a |
publicationDate | 2008-07-01^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | US-7393795-B2 |
titleOfInvention | Methods for post-etch deposition of a dielectric film |
abstract | Methods for post-etch deposition on a dielectric film are provided in the present invention. In one embodiment, the method includes providing a substrate having a low-k dielectric layer disposed thereon in a etch reactor, etching the low-k dielectric layer in the etch reactor, and forming a protection layer on the etched low-k dielectric layer. In another embodiment, the method includes providing a substrate having a low-k dielectric layer disposed thereon in an etch reactor, etching the low-k dielectric layer in the reactor, bonding the etched low-k dielectric layer with a polymer gas supplied into the reactor, forming a protection layer on the etched low-k dielectric layer, and removing the protection layer formed on the etched low-k dielectric layer. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11302519-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9165783-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I693641-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I713116-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014120726-A1 |
priorityDate | 2006-02-01^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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