Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_51d028c578ae85cb937b5b34a5129fbc |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76844 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76802 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76888 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76834 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02252 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53266 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53238 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76877 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-5329 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53209 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-5283 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53228 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76865 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76849 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76856 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-44 |
filingDate |
2005-06-03^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2008-07-22^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b45558505929cbf76e175ac2c2df197f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_657fcd061f5476474c252bca7fdd43df http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c40550a0065756b6514a132df9e8e040 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_91275181c041b0f13a2ad9b38ab28a3f |
publicationDate |
2008-07-22^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-7402519-B2 |
titleOfInvention |
Interconnects having sealing structures to enable selective metal capping layers |
abstract |
Methods of fabricating a capped interconnect for a microelectronic device which includes a sealing feature for any gaps between a capping layer and an interconnect and structures formed therefrom. The sealing features improve encapsulation of the interconnect, which substantially reduces or prevents electromigration and/or diffusion of conductive material from the capped interconnect. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008277797-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8354751-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8920617-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009309226-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8446012-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9460988-B2 |
priorityDate |
2005-06-03^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |