| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d89a1fdfad4ceb45818cee0bfda31a6 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0505
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K1-0284 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-24 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G21K5-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F9-00 |
| filingDate |
2007-08-09^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2009-12-01^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ccf8b78e62e374466c303aaa2202355d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_26cda4ec7cd818c5dbc1cb853e26822a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_51e65cd2b8a4c84ac6cd18ea35a43870
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9e4bfb8cf139568f1d69881c8331055b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d44ed39c9ab14c78073e88e7cc7260ab |
| publicationDate |
2009-12-01^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7626185-B2 |
| titleOfInvention |
Patterning compositions, masks, and methods |
| abstract |
Electromagnetic radiation sensitive mask materials are provided. The mask materials are chosen such a first percentage of electromagnetic radiation at a first wavelength is transmitted through the mask material prior to the exposure of the mask material to electromagnetic radiation at a second wavelength and a second percentage of electromagnetic radiation at the first wavelength is transmitted through at least a portion of the mask material after the at least a portion of the mask material is exposed to electromagnetic radiation at the second wavelength. Methods of patterning substrates using electromagnetic radiation sensitive mask materials are also provided. Compositions for producing masks are provided, and systems are provided. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10162242-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10380955-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10586499-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10431168-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10234742-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10147366-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11266832-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10891907-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10891906-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9541814-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9459510-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010261098-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11315505-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9513527-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8187775-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10036931-B2 |
| priorityDate |
2006-08-11^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |