| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2e5f48770488430ce8e90de22197719e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_46f6b459c61b18bcc0bd03d85219d26d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8b479030db5460b3c2c6f011d90852d1 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32935
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01R31-08 |
| filingDate |
2009-07-07^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2012-05-15^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dbd486cdbc5c970fad35ec87be1b5099
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_33c5ee6c92b05f3577276cc88d3ce796
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_44693918c29e06a042bcf7d29116c008 |
| publicationDate |
2012-05-15^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8179152-B2 |
| titleOfInvention |
Passive capacitively-coupled electrostatic (CCE) probe arrangement for detecting plasma instabilities in a plasma processing chamber |
| abstract |
An arrangement for detecting plasma instability within a processing chamber of a plasma processing system during substrate processing is provided. The arrangement includes a probe arrangement, wherein the probe arrangement is disposed on a surface of the processing chamber and is configured to measure at least one plasma processing parameter. The probe arrangement includes a plasma-facing sensor and a measuring capacitor, wherein the plasma-facing sensor is coupled to a first plate of the measuring capacitor. The arrangement also includes a detection arrangement, which is coupled to a second plate of the measuring capacitor. The detection arrangement is configured to convert an induced current flowing through the measuring capacitor into a set of digital signals, the set of digital signals being processed to detect the plasma instability. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9129779-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013221847-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012259562-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011181313-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9017513-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9153421-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9170295-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8823404-B2 |
| priorityDate |
2008-07-07^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |