| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4887d88785183659ac31aaaf47671e4f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24df3ce7b211b98b8dfc92b5af19ff12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a6416165ecdd676e3707a55f698bf95c |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-1825
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T137-0368 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32834
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F17D1-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45502
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-06 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-00 |
| filingDate |
2007-04-06^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-02-05^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0eeb3aa374c26185e910c1aba44f5165
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d3d02ecf778ed382abb5fce633e0c409
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_10e8cdcdd1744c8ac8c1a6307f0f4b04 |
| publicationDate |
2013-02-05^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8366869-B2 |
| titleOfInvention |
Processing apparatus and processing method |
| abstract |
A processing apparatus includes a process container having a placing table for placing a processing object, an exhaust system having vacuum pumps and a pressure control valve for exhausting atmosphere in the process container. A gas injection unit having a gas ejection hole is provided in the process container, as well as a gas supplying unit for supplying a process gas to the gas injection unit. The entire process apparatus is controlled by a controlling unit. The control unit controls the exhaust system and the gas supplying unit. When starting a predetermined process, the process gas at a flow rate greater than a prescribed flow rate is supplied for a short time while exhausting the atmosphere in the process container by the exhaust system, and then the process gas at a prescribed flow rate is supplied. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10526700-B2 |
| priorityDate |
2006-04-07^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |