| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3eba05f985e36fe8f4be4d251ad17b50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ff81a650b70e913d3b2524b45e4c7320 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D519-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D487-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D209-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D207-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G75-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G75-30 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-00 |
| filingDate |
2010-08-26^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-03-26^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_28bc9f290b7ca857c6d3d7f375595800 |
| publicationDate |
2013-03-26^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8404795-B2 |
| titleOfInvention |
Photolytic acid-generating polymers and monomers for their construction |
| abstract |
Polymers for photoresists and monomers for incorporation into those polymers are disclosed. The polymers comprise a photoacid generator (PAG) component and at least a second component that is photolytically stable and acid-stable. The polymers may also contain a third, acid-labile component. The photoacid generator is based on N-sulfoxyimides and related moieties that contain photolabile oxygen-heteroatom and oxygen-aromatic carbon bonds. |
| priorityDate |
2009-08-26^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |