| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_339fadd21fc3a91e8c4c6c7bb3dc2628
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a0cb82c3323a00d4186c176247279edb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8e34828bbe0f14dc3760128802b26466
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a2d1ca028edb9cf27f393e0702a6d3ed |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07J9-005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C49-423
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-608
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2012-01-31^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-04-23^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_43c1f2930da6ea948f4f992fad9a0d3f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f971b7988c2e5fd27c26a6cca9c6e2a6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a68bfaad1b36535328b4aae6c8f3a83b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b4f2cd9890e3a4332b77960cdb8461b |
| publicationDate |
2013-04-23^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8426110-B2 |
| titleOfInvention |
Chemically amplified positive resist composition, patterning process, and acid-decomposable keto ester compound |
| abstract |
A chemically amplified positive resist composition comprises an acid-decomposable keto ester compound of steroid skeleton which is insoluble in alkaline developer, but turns soluble in alkaline developer under the action of acid. The composition is exposed to EB, deep-UV or EUV and developed to form a pattern with a high resolution and improved LER. |
| priorityDate |
2011-01-31^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |