| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3d162bd56c615b34a08f500b3c59cbf6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bedead7c3f85cd80952e7e0dd57e564f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c692a8df244d749e1638f73aea03ef90 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-0817
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J49-167
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-0815
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-31749 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3171
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32018
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J27-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J27-205 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J49-16 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61L2-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J27-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-317
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J49-40 |
| filingDate |
2012-02-28^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-07-09^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de47a8d4ab713327a5439c80ac015769
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b9704f756b7b5dcdb619f1b13a9ec85 |
| publicationDate |
2013-07-09^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8481966-B1 |
| titleOfInvention |
Microplasma ion source for focused ion beam applications |
| abstract |
A high pressure microplasma source operating in a normal glow discharge regime is used to produce a cold bright focused beam of Xe + and/or Xe 2 + ions having ion temperature of the order of 0.5-1 eV and a current density on the order of 0.1-1 A/cm 2 or higher for focused ion beam applications. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021104393-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111093312-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8674321-B2 |
| priorityDate |
2012-02-28^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |