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filingDate 2010-04-27^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2013-10-08^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2169b3514cbf44613575b0dcaa9e4783
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publicationDate 2013-10-08^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-8551609-B2
titleOfInvention Method of depositing niobium doped titania film on a substrate and the coated substrate made thereby
abstract A coated article includes a pyrolytic applied transparent electrically conductive oxide film of niobium doped titanium oxide. The article can be made by using a coating mixture having a niobium precursor and a titanium precursor. The coating mixture is directed toward a heated substrate to decompose the coating mixture and to deposit a transparent electrically conductive niobium doped titanium oxide film on the surface of the heated substrate. In one embodiment of the invention, the method is practiced using a vaporized coating mixture including a vaporized niobium precursor; a vaporized titanium precursor, and a carrier gas to deposit a niobium doped titanium oxide film having a sheet resistance greater than 1.2 and an index of refraction of 2.3 or greater. The chemical formula for the niobium doped titanium oxide is Nb:TiO X where X is in the range of 1.8-2.1.
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