Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b3c2e77f8dfda692ca527454d23ecc03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3b91e18e9132d56692cdeb8f1cd1452c |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C2059-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C2035-0827 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-026 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-02 |
filingDate |
2007-10-31^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2014-05-20^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_53777efa87740c712b71f15e7163bef2 |
publicationDate |
2014-05-20^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-8728380-B2 |
titleOfInvention |
Lithographic method for forming a pattern |
abstract |
A lithographic method for forming a pattern within a surface on a substrate includes providing a substrate with a degradable material, molding the material to imprint a pattern thereon, depositing a layer of a second material over the imprinted pattern, removing portions of the layer of the second material to expose portions of the imprinted pattern of degradable material and removing portions of the exposed degradable material to leave an open pattern in the layer of second material. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11675273-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021219005-A1 |
priorityDate |
1995-11-15^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |