| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6aac4d56f442e1337548d4903177f230
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1476752f2420c8f8eb53464cf7fc922b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_59802d193ac533fe3bd7aecb9cccca43 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H2003-021
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-49005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-49798
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-49128
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-49155 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H3-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H9-173 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-083
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H03H9-17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-332
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-338
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-39
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H03H3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-22 |
| filingDate |
2008-03-24^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2014-07-15^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_17c71d24a65f5cd591112ac7182495fc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7418eecf15f4d25d5e0647e91c02b0e5 |
| publicationDate |
2014-07-15^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8776334-B2 |
| titleOfInvention |
Piezoelectric thin film resonator and manufacturing method thereof |
| abstract |
A method of manufacturing a piezoelectric thin film resonator which can reduce variations in resonant frequency and resonant resistance by uniformly planarizing a structural film. The method of manufacturing the piezoelectric thin film resonator includes the steps of forming sacrifice layer patterns on an upper surface of a mother substrate; forming a dielectric film on the sacrifice layer patterns; processing a surface of the dielectric film by a plasma treatment; forming vibration portions on the dielectric film, the vibration portions each being composed of two excitation electrodes and a piezoelectric thin film provided therebetween; etching the sacrifice layer patterns; and cutting the mother substrate into separate piezoelectric thin film resonators. |
| priorityDate |
2004-12-24^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |