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publicationDate 2015-03-31^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-8993088-B2
titleOfInvention Polymeric materials in self-assembled arrays and semiconductor structures comprising polymeric materials
abstract Methods for fabricating sublithographic, nanoscale microstructures in line arrays utilizing self-assembling block copolymers, and films and devices formed from these methods are provided. Semiconductor structures may include self-assembled block copolymer materials in the form of lines of half-cylinders of a minority block matrix of a majority block of the block copolymer. The lines of half-cylinders may be within trenches in the semiconductor structures.
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