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filingDate 2006-08-25^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2015-09-08^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2015-09-08^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-9126303-B2
titleOfInvention Method for production of a laminate polishing pad
abstract Disclosed is a method for production of a laminate polishing pad which comprises a reduced number of steps and is excellent in productivity rate, and which causes no detachment between a polishing layer and a cushion layer and can prevent the groove clogging caused by a slurry or the like. Also disclosed is a laminate polishing pad produced by the method. A method for production of a laminate polishing pad, comprising the steps of: preparing a cell-dispersed urethane composition by a mechanical frothing process; ejecting the cell-dispersed urethane composition onto a cushion layer continuously while feeding the cushion layer; curing the cell-dispersed urethane composition while controlling the thickness of the composition evenly to form a polishing layer made of a polyurethane foam, thereby producing a long laminate sheet; and cutting the long laminate sheet.
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