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filingDate 2012-06-12^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2016-01-12^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-9234849-B2
titleOfInvention Method and system for inspecting indirect bandgap semiconductor structure
abstract Methods ( 600 ) and systems ( 100 ) for inspecting an indirect bandgap semiconductor structure ( 140 ) are described. A light source ( 110 ) generates light ( 612 ) suitable for inducing photoluminescence in the indirect bandgap semiconductor structure ( 140 ). A short-pass filter unit ( 114 ) reduces long-wavelength light of the generated light above a specified emission peak. A collimator ( 112 ) collimates ( 616 ) the light. A large area of the indirect bandgap semiconductor structure ( 140 ) is substantially uniformly and simultaneously illuminated ( 618 ) with the collimated, short-pass filtered light. An image capture device ( 130 ) captures ( 620 ) images of photoluminescence simultaneously induced by the substantially uniform, simultaneous illumination incident across the large area for the indirect bandgap semiconductor structure. The photoluminescence images are image processed ( 622 ) to quantify spatially resolved specified electronic properties of the indirect bandgap semiconductor structure ( 140 ) using the spatial variation of the photoluminescence induced in the large area.
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