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filingDate 2014-12-16^^<http://www.w3.org/2001/XMLSchema#date>
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inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_02c58adf32d1cbc9f894518d976ed7f7
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publicationDate 2017-05-02^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-9640386-B2
titleOfInvention Precursors for CVD silicon carbo-nitride films
abstract Classes of liquid aminosilanes have been found which allow for the production of silicon carbo-nitride films of the general formula Si x C y N z . These aminosilanes, in contrast, to some of the precursors employed heretofore, are liquid at room temperature and pressure allowing for convenient handling. In addition, the invention relates to a process for producing such films. n The classes of compounds are generally represented by the formulas: n n n n n n n n n n and mixtures thereof, wherein R and R 1 in the formulas represent aliphatic groups typically having from 2 to about 10 carbon atoms, e.g., alkyl, cycloalkyl with R and R 1 in formula A also being combinable into a cyclic group, and R 2 representing a single bond, (CH 2 ) n , a ring, or SiH 2 .
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