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grantDate 2017-10-03^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2017-10-03^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-9777025-B2
titleOfInvention Si-containing film forming precursors and methods of using the same
abstract Mono-substituted TSA precursor Si-containing film forming compositions are disclosed. The precursors have the formula: (SiH 3 ) 2 N—SiH 2 —X, wherein X is selected from a halogen atom; an isocyanato group; an amino group; an N-containing C 4 -C 10 saturated or unsaturated heterocycle; or an alkoxy group. Methods for forming the Si-containing film using the disclosed mono-substituted TSA precursor are also disclosed.
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