| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5157cc9d29989d27bd65a85902ddb054 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-2308
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-10069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-0014
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-0971 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-2308
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-0971
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-2251
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-104
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-2258
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-097
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-036
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-10069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-0014
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-225
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-2256
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-2255
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-2253 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01S3-225
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01S3-036
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01S3-097 |
| filingDate |
2016-04-19^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-11-14^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6dfd49969e552290bcccf1bc36c0073b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f1fed1e983c4d9ad77e6ddeb00b05085 |
| publicationDate |
2017-11-14^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9819136-B2 |
| titleOfInvention |
Gas mixture control in a gas discharge light source |
| abstract |
A gas discharge light source includes a gas discharge system that includes one or more gas discharge chambers. Each of the gas discharge chambers in the gas discharge system is filled with a respective gas mixture. For each gas discharge chamber, a pulsed energy is supplied to the respective gas mixture by activating its associated energy source to thereby produce a pulsed amplified light beam from the gas discharge chamber. One or more properties of the gas discharge system are determined. A gas maintenance scheme is selected from among a plurality of possible schemes based on the determined one or more properties of the gas discharge system. The selected gas maintenance scheme is applied to the gas discharge system. A gas maintenance scheme includes one or more parameters related to adding one or more supplemental gas mixtures to the gas discharge chambers of the gas discharge system. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023278097-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10090629-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017229832-A1 |
| priorityDate |
2016-01-08^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |