http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9887196-B2

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filingDate 2014-12-29^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2018-02-06^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d06526a9ee0752f69fa1657b45b8d8a
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publicationDate 2018-02-06^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-9887196-B2
titleOfInvention FinFET including tunable fin height and tunable fin width ratio
abstract A semiconductor substrate includes a bulk substrate layer that extends along a first axis to define a width and a second axis perpendicular to the first axis to define a height. A plurality of hetero semiconductor fins includes an epitaxial material formed on a first region of the bulk substrate layer. A plurality of non-hetero semiconductor fins is formed on a second region of the bulk substrate layer different from the first region. The non-hetero semiconductor fins are integrally formed from the bulk substrate layer such that the material of the non-hetero semiconductor fins is different from the epitaxial material.
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priorityDate 2014-04-07^^<http://www.w3.org/2001/XMLSchema#date>
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