Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a8a9982b1666c54b5bf02d6c944891e4 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2217-214 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2218-116 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2218-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2218-113 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B13-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1204 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-25 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1295 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1254 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1241 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1245 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1216 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C17-25 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B13-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B29-20 |
filingDate |
2015-09-14^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2018-05-22^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1642eb6c27b5b56493a3ade7676f1dd7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_52260ef3f8be11d457b66cef3ffae9dc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd3a4ca59410bb431c1a672de2eac974 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f19fe44be2aba383cd76e2c67516feeb |
publicationDate |
2018-05-22^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-9976230-B2 |
titleOfInvention |
Method for forming a scratch resistant crystallized layer on a substrate and article formed therefrom |
abstract |
A crystallized layer can be formed on a substrate from a precursor layer deposited on a surface of the substrate. The precursor layer can be an oxide, a nitride, a carbide, or an oxynitride. The process for forming the crystallized layer includes melting the precursor layer formed on the surface of the substrate by localized topical heating of the precursor layer and then cooling the melted precursor layer so that it crystallized to form a scratch resistant crystallized layer. The scratch resistant crystallized layer can have a hardness of 15 GPa or greater. |
priorityDate |
2014-09-19^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |