| abstract |
A fluid distribution system for supplying a gas to a process facility such as a semiconductor manufacturing plant includes a main liquid supply vessel (12) coupled by flow circuitry to a local sorbent-containing supply vessel (50, 94) from which fluid such as a gas is dispensed to a fluid-consuming unit (86, 130). A fluid pressure regulator (4, 7) is disposed in the flow circuitry or the main liquid supply vessel and ensures that the gas flowed to the fluid-consuming unit is at desired pressure. |