http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004049067-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bd9e41877bdcc2528519e0c5a96a8af8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dc05229904be2987713acc8b41db7cd3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bb4e499a8ad109da1e0b163ad4dd8292 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2024 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate | 2003-11-14^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b0d7c34966dd05f52d03118611c6314 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4a93ec26c77e88a33c102fb557ba0194 |
| publicationDate | 2004-06-10^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2004049067-A1 |
| titleOfInvention | Method of pattern formation using ultrahigh heat resistant positive photosensitive composition |
| abstract | In a process in which it is demanded for a photoresist pattern to have high heat resistance, for example, production of a TFT active matrix substrate, an ultrahigh heat resistant positive pattern is formed with the use of a positive photosensitive composition according to the following method of pattern formation. The method of pattern formation comprises the step of coating a substrate with a photosensitive composition comprising an alkali soluble resin (a), a photosensitive agent having a quinonediazido group (b), a photo-acid generator (c), a crosslinking agent (d) and a solvent (e) and exposing the coating to light through a mask; the step of removing exposed portions by development to thereby form a positive image; the step of effecting overall exposure of the formed positive image to light; and optionally the step of post baking. When a 1,2-naphthoquinonediazide-4-sulfonyl compound is used as the photosensitive agent having a quinonediazido group, this compound also acts as the photo-acid generator, so that the above component (c) can be omitted. |
| priorityDate | 2002-11-27^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
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