| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aa854e67754795a38639b04b16da6009
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_709f22cdef952244a0aa846eb7ff37ae
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_71f462c1d0cd40b9e43ceab07b8ab70d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a0b859cea2a10606acc8665663844159 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1669
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1675
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68728
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-288
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67748
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1619
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1676
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1664
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1689
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1666
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67126 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-288
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
| filingDate |
2004-06-16^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2b1066c3f671406fdacfd50bbd45e0f8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b81f90581daa75e5e8511397091f485
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_63044aca014a968de4696097172c2910 |
| publicationDate |
2004-12-29^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2004114386-A2 |
| titleOfInvention |
Methods and system for processing a microelectronic topography |
| abstract |
Methods and systems are provided which are adapted to process a microelectronic topography, particularly in association with an electroless deposition process. In general, methods are provide which include loading a topography into a chamber and supplying fluids to an enclosed area about the topography. In particular, a method is provided for forming a hydrated metal oxide layer. In addition, a method is provided for selectively depositing a dielectric layer and a metal layer upon a topography. A topography having a single layer with at least four elements lining a lower surface and sidewalls of a metal feature is also provided. A process chamber which includes a gate configured to either seal or provide an air passage to the chamber and a substrate holder comprising a clamping jaw with a lever are contemplated herein. A process chamber with a reservoir arranged above a substrate holder is also provided. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8282999-B2 |
| priorityDate |
2003-06-16^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |