| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_114988d6c0bb26857a009426758e6441
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aa7d8eacceba9d48d333481afef1beec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2007-06-13^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3764505afc0783c61206d154527f07e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef0141af8da3d5a31b86c6293b06be62 |
| publicationDate |
2007-12-21^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2007145249-A1 |
| titleOfInvention |
Positive photosensitive resin composition containing polymer having ring structure |
| abstract |
[PROBLEMS] To provide a positive photosensitive resin composition which has high sensitivity and is reduced in film thickness reduction in unexposed areas and which, after film formation, retains a high transmission and a film thickness even through high-temperature burning or treatment with a liquid resist stripper and does not crack during ITO sputtering; and a cured film suitable for use as a film material for various displays. [MEANS FOR SOLVING PROBLEMS] The positive photosensitive resin composition comprises: ingredient (A) which is an alkali-soluble acrylic polymer having at least one of carboxy and phenolic hydroxy and at least one of hydroxy other than phenolic hydroxy and amino having active hydrogen and having a number-average molecular weight of 2,000-30,000; ingredient (B) which is an alkali-soluble resin having a ring structure in the backbone; ingredient (C) which is a compound having a vinyl ether group; ingredient (D) which is a compound having a blocked isocyanate group; ingredient (E) which is a photo-acid generator; and a solvent (F). The cured film is obtained from the composition. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014034302-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2012018121-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5835586-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10802401-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7267812-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2014034301-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8168371-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020066137-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017057281-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011521295-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2014034302-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011022511-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8828651-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014034301-A1 |
| priorityDate |
2006-06-15^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |