| abstract |
The invention relates to a method for recycling silane that comprises the following consecutive steps: a) injecting a mixture of pure silane/pure hydrogen (SiH 4 /H 2 ) in a reaction chamber for making silicon-containing thin layers; b) extracting from the mixture the excess of silane not used during step a) / hydrogen (SiH 4 /H 2 ) via a pump using a supply gas; c) discharging from said pump, at a pressure close to the atmospheric pressure, a mixture containing at least silane (SiH 4 ), hydrogen (H 2 ) and an amount different from zero of said supply gas; d) separating the silane (SiH 4 ) from the hydrogen/supply gas mixture resulting from the mixture from step c), the silane thus obtained containing less than 100 ppm of supply gas, preferably less than 10 ppm of supply gas and more preferably less than 1 ppm of supply gas; characterised in that at least 50%, preferably 70%, and more preferably 80% of the silane (SiH 4 ) from step b) is reused after step d) for a new step a). |