| abstract |
Disclosed is a base-generating agent represented by formula (1), which can generate a base upon the irradiation with an electromagnetic wave and heating. The base-generating agent has an excellent sensitivity and is applicable to polymer precursors regardless of the types of the polymer precursors. Also disclosed is a photosensitive resin composition containing the base-generating agent. In the photosensitive resin composition, high dissolution contrast can be produced between an area exposed to light and an area unexposed to light. Therefore, the photosensitive resin composition enables the formation of a pattern having a good shape. |