| abstract |
Provided is a composition for an insulating layer, which can form an insulating layer (for instance, a gate insulating film and a protection layer for a transistor) at a low temperature, and furthermore, can form an insulating layer having excellent withstand voltage. The composition for an insulating layer includes a first compound composed of a polymeric compound having two or more active hydrogen groups in a molecule, and a second compound composed of a low-molecular compound having two or more groups which generate, in a molecule, a functional group which reacts to the active hydrogen groups by an electromagnetic line or heat. |