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publicationDate 2010-01-14^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2010006181-A2
titleOfInvention Methods and apparatus for abating electronic device manufacturing process effluent
abstract A thermal abatement system is provided, including: a thermal abatement reactor; an inlet in fluid communication with the reactor; a process chamber in fluid communication with the inlet; a first sheathing fluid source in fluid communication with the inlet; a first flow control device, adapted to regulate a flow of a first sheathing fluid from the first sheathing fluid source; and a controller, in signal communication with the first flow control device, adapted to regulate the sheathing fluid by operating the first flow control device; wherein the inlet is adapted to receive an effluent stream from the process chamber and the first sheathing fluid from the first sheathing fluid source, to sheathe the effluent stream with the first sheathing fluid to form a sheathed effluent stream, and to introduce the sheathed effluent stream into the reactor.
priorityDate 2008-07-11^^<http://www.w3.org/2001/XMLSchema#date>
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