| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_444d3641747bb086afc4ad00c49f770b |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0385
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-73
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-14 |
| filingDate |
2011-07-15^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bfc2130ea9d70686923a26b15a51355e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_944803a2e3c3e1b2fd35adf01b98e035
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b0742b7002b64cad6ae9497199d7250b |
| publicationDate |
2012-02-16^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2012021253-A1 |
| titleOfInvention |
Epoxy formulations with controllable photospeed |
| abstract |
The present invention is directed to an epoxy film composition, comprising: novolac resin; solvent; a photoacid generator having the structure A+B" and having a pKa of -5 or less; and a photolabile quencher generator having the structure C+D" and having a pKa greater than -10; wherein B" and D" are different; wherein the amount of the photoaci generator ranges from 0.1 to 7 wt%, based on the total weight of the composition; and wherein the amount of the photolabile quencher generator ranges from 0.1 to 20 wt%, based on the total weight of the photoacid generator. The present invention is also directed to a method of controlling photospeed in a negative photoresist. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107325264-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107325264-A |
| priorityDate |
2010-08-11^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |