| abstract |
Provided is a method of forming a pattern, including forming a film of an actinic-ray- or radiation-sensitive resin composition on a substrate, exposing the film to actinic rays or radiation and developing the exposed film with a developer to thereby obtain a fine pattern, characterized in that the actinic-ray- or radiation-sensitive resin composition comprises a polymeric compound (A) containing any of repeating units of general formula (I) below, and that the developer comprises tetrapropylammonium hydroxide. |