| abstract |
Described are manganese-containing films, as well as methods for providing the manganese-containing films. Doping manganese-containing films with Co, Mn, Ru, Ta, Al, Mg, Cr, Nb, Ti or V allows for enhanced copper barrier properties of the manganese- containing films. Also described are methods of providing films with a first layer comprising manganese silicate and a second layer comprising a manganese-containing film. |