| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6f79749e86afce9444a364ab60ca3584
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_85acbcf556e8a2b3023ab70f44e199c8 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61B2562-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61B5-4064 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L33-382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-022408
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61B5-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61B5-291
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61B5-0084 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61B5-0478
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61B5-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61N1-04 |
| filingDate |
2014-05-27^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_92adcea7f6b0f1d81c7079d3c9065204
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11710b3786f6beba7753210df2963514
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d0336bb9786a295392fdba88bc53a99
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2891ffe88b9060c6fdeac106aa283c5 |
| publicationDate |
2014-11-27^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2014190343-A1 |
| titleOfInvention |
Integrated thin-film optrode |
| abstract |
An optrode may provide a cylindrical substrate two or more electrodes deposited said cylindrical substrate. The cylindrical substrate and electrodes may be coated by an insulating layer with openings or vias over certain portions of the electrodes that may provide a contact for the neural probe or may be utilized to connect lead lines. Manufacturing of an optrode may utilize a jig that secures a cylindrical substrate coated by a conductive material and a resist. A first mask may be positioned in an opening provided by the jig, and the cylindrical substrate may be exposed ions or neutral particles to define one or more electrode patterns. After regions of the resist and conductive material are removed to form the electrodes, a second mask may be utilized to define vias regions in which portions of the electrodes are exposed and uncoated by an insulating layer. |
| priorityDate |
2013-05-24^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |