| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed89ca88042d3b6f7afc21d7b6dd7b87 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3365 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32412
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32532
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32422
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32568 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-08 |
| filingDate |
2014-12-08^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3dc7baf09b8832629e21c1b11ccb7c3f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_59650ccef004766603609ede9ecc9049
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c9f21c1c098aacf5326dae57b5edbe83
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a384ff47427814a6f72c13277dbdc5fe |
| publicationDate |
2015-07-02^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2015099988-A1 |
| titleOfInvention |
In situ control of ion angular distribution in a processing apparatus |
| abstract |
A processing apparatus may include a plasma source coupled to a plasma chamber to generate a plasma in the plasma chamber, an extraction plate having an aperture disposed along a side of the plasma chamber; a deflection electrode disposed proximate the aperture and configured to define a pair of plasma menisci when the plasma is present in the plasma chamber; and a deflection electrode power supply to apply a bias voltage to the deflection electrode with respect to the plasma, wherein a first bias voltage applied to the deflection electrode is configured to generate a first angle of incidence for ions extracted through the aperture from the plasma, and a second bias voltage applied to the deflection electrode is configured to generate a second angle of incidence of ions extracted through the aperture from the plasma, the second angle of incidence being different from the first angle of incidence. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101754563-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019125598-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10276340-B1 |
| priorityDate |
2013-12-23^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |