| abstract |
The reactor (R) has a reaction chamber (RC) provided with a support (S) for the metallic pieces (1) and with a system of an anode (2), connected to a ground (2b), and of a cathode system (3) connected to the support (S) and to a pulsating DC power supply (10). In the reaction chamber (RC), which is heated and supplied with a gas load is formed, by means of an electric discharge in the cathode (3), a gas plasma. A liquid or gas precursor is admitted in at least one tubular cracking chamber (20) associated with a high voltage energy source (30). It may be provided at least one tubular sputtering chamber (40) associated with an electric power supply (50) receiving a solid precursor. A potential difference is applied between the anode (2) and one and/or other of said tubular chambers (20, 40), in order to release the alloy elements to be ionically bombarded against the metallic pieces (1), either simultaneously or individually and in any order. |