http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016125782-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_696ca0ae93d5cf5a686273601361781f |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D307-33 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D307-94 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D307-94 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D307-33 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate | 2016-02-02^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f15abea88572576cc528bffedcfcddc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db34bc7ca537416abf095de84fdae398 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4059b941b849f42d38970ce99448cfad http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf2b79de9bae00c1b4a73941db3a5431 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_204204ac944eeab1a4a1267e1ffdc23d |
| publicationDate | 2016-08-11^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2016125782-A1 |
| titleOfInvention | Novel alicyclic ester compound, (meth)acrylic copolymer, and functional resin composition containing same |
| abstract | As a chemically amplified resist, the present invention provides a resist and compound having a good balance by which line edge roughness (LER) is improved without impairing basic physical properties inherent in a resist, such as base adhesion properties and resistance to dry etching. Provided are a lactone ester compound represented by general formula (1), a method for producing same, a (meth)acrylic copolymer comprising general formula (1), and a photosensitive resin composition containing same. (In formula (1): R 1 denotes a hydrogen atom or a methyl group; R 2 denotes a hydrogen atom, an aliphatic alkyl group having 1-10 carbon atoms or an alkyl group having an alicyclic structure having 3-10 carbon atoms; R 3 denotes a hydrogen atom, an alkoxycarbonyl group represented by formula (2), an aliphatic alkyl group having 1-10 carbon atoms or an alkyl group having an alicyclic structure having 3-10 carbon atoms; here, R 2 and R 3 may bond to each other to form an alicyclic structure having 3-10 carbon atoms; and n1 is an integer between 0 and 2.) (In formula (2): R 4 denotes an aliphatic alkyl group having 1-13 carbon atoms or an alkyl group having an alicyclic structure having 3-13 carbon atoms; and the dotted line denotes the bonding location in the compound represented by formula (1).) |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016173513-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014139650-A |
| priorityDate | 2015-02-05^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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