http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017176023-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_adeaf91d4609a028297a06a54e538ee4 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32311 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32935 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32532 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate | 2017-04-04^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7f1537c467d6e5781e0581e747c26cd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_959ee2692d5a74ff1bc0f6287b25da99 |
| publicationDate | 2017-10-12^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2017176023-A1 |
| titleOfInvention | Plasma processing apparatus capable of adjusting charge amount |
| abstract | The present invention relates to a plasma processing apparatus capable of adjusting the amount of charges, including plasma ions reaching a substrate, according to the properties of a substrate. The plasma processing apparatus comprises a charge amount measurement device and a control unit. The charge amount measurement device measures a charge amount in an area of a substrate, and the control unit controls power applied to an ion source to cause the measured charge amount, which is received from the charge amount measurement device, to converge to an optimal charge amount of the substrate. |
| priorityDate | 2016-04-05^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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