| abstract |
It is an object of the present invention to provide a radiation-sensitive composition that is excellent in sensitivity and resolution, and a resist pattern formation method. More specifically, the invention relates to a radiation-sensitive composition which comprises a polymetalloxane having a structural unit represented by formula (1), a body generating a radiation-sensitive acid, and a solvent. In the formula (1), M represents a germanium atom, a tin atom or a lead atom. Ar 1 represents a substituted or unsubstituted 6- to 20-membered aryl group, or a substituted or unsubstituted 5 to 20 membered heteroaryl group. R1 represents a monovalent organic group of 1 to 20 carbon atoms, a hydrogen atom, a hydrogen atom and a hydroxy group. n represents 2 or 3. |