| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7729637c1c11237c25aae87a94d69dd5 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J20-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J20-3425
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J20-3441
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J49-0031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J49-164
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J49-0418 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-64
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N33-483
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J49-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-10 |
| filingDate |
2019-03-19^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8711a7992e16b91e832b5be5f9308ce2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c5d321d9c5ef9f6cc7cc6cde604bf24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7a5b9fbd7e1bf150d4bc976e38ede4fe
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d523c5c93e8f618d340872a3cdbc922d |
| publicationDate |
2019-09-26^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2019181970-A1 |
| titleOfInvention |
Organic silica thin film, method for producing the same, laser desorption/ionization mass spectrometric substrate using the same, and laser desorption/ionization mass spectrometric method |
| abstract |
An organic silica thin film comprising: organic silica having a light absorbable organic group in a skeleton, wherein the organic group has a local maximum absorption wavelength in a wavelength range of 200 to 1200 nm, a content ratio of silicon and the organic group which constitute the organic silica is in a range of 0.05 to 0.50 based on a ratio of a mass of the silicon to a mass of the organic group ([mass of the silicon]/[mass of the organic group]), the thin film has a textured structure, and an axis direction of the textured structure is a direction substantially perpendicular to a surface opposite to a surface of the organic silica thin film having the textured structure formed therein. |
| priorityDate |
2018-03-22^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |