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filingDate 2019-05-01^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2019-11-07^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2019213207-A1
titleOfInvention Methods of increasing selectivity for selective etch processes
abstract Processing methods comprising etching a metal nitride layer with an etchant. The etchant can be, for example, WCl 5 , WOCl 4 or TaCl 5 . Methods of improving the selectivity of etch processes are also disclosed.
priorityDate 2018-05-01^^<http://www.w3.org/2001/XMLSchema#date>
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