http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019231342-A2

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filingDate 2019-05-27^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2019-12-05^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2019231342-A2
titleOfInvention Process, reactor and system for the customization of autonomous nanostructures using microwave plasma
abstract The invention relates to a process, a reactor and a system for the customization of autonomous nanostructures, using a microwave-excited plasma environment in which the microwaves are sustained by surface waves (SW). Two distinct streams are injected into two distinct zones of a plasma reactor, the first stream (FS) being constituted by carrier gases and by the nanostructures to be customized and the second stream (SS) by a mixture of inert gases, at least one dopant component precursor (DCP) and/or at least one type of microparticles (MP). The FS is injected into part (7) of the reactor and the SS in part (6). The SS is exposed to the electrical field of a surface wave excited by microwave power, creating a hot plasma (8). The two streams join together in zones (4) and (5), where the nanostructures are customized through their interaction with the components coming from the SS.
priorityDate 2018-05-29^^<http://www.w3.org/2001/XMLSchema#date>
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