| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D327-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D333-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D327-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D333-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D327-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D333-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D327-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D333-76 |
| filingDate |
2020-06-16^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d773c26933f47f09f8fae9fcf14edf1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2755db4cf58164bd00e91fcc1d759dcc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ebd32e8e8f12387c4ee13ecf39f1281b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_52952b8c410fab9bc4b7afccd4de94f1 |
| publicationDate |
2020-12-24^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2020255964-A1 |
| titleOfInvention |
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and electronic device manufacturing method |
| abstract |
Provided is an actinic ray-sensitive or radiation-sensitive resin composition by which a pattern having excellent LWR performance can be formed. Provided are: a resist film and a pattern forming method which use the actinic ray-sensitive or radiation-sensitive resin composition; and an electronic device manufacturing method using the pattern forming method. The actinic ray-sensitive or radiation-sensitive resin composition contains an acid-labile resin and a compound that generates an acid upon irradiation with actinic rays or radiation, wherein the compound that generates an acid upon irradiation with actinic rays or radiation includes at least one compound selected from the group consisting of compounds (I)-(III), and the content of the compound selected from the group consisting of compounds (I)-(III) is greater than 20.0 mass% with respect to the total solid content in the composition. |
| priorityDate |
2019-06-21^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |