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filingDate 2020-07-29^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee2283956c7e9b6dbd54b4f63a1c0d52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_20d9eba0265ed03db799597bc00012b4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1b729bf72dce938ae14b340300e2a0c1
publicationDate 2021-02-04^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2021018926-A1
titleOfInvention Negative type photosensitive composition
abstract [Problem] To provide a negative type photosensitive composition which can be developed with a low-concentration developer. [Means for Solution] A negative type photosensitive composition comprising (I) an alkali-soluble resin having a carboxyl group, (II) a polymerization initiator, (III) a compound containing two or more (meth)acryloyloxy groups, and (IV) a solvent, wherein the content of the compound containing two or more (meth)acryloyloxy groups is 40 to 300 mass % based on the total mass of the alkali-soluble resin.
priorityDate 2019-07-31^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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