| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bed98c1eb721758c4d0126d2d0a65560 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D209-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D239-96
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D209-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D209-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D335-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D495-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D487-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D471-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D221-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D221-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C311-49 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D209-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D209-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D209-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D495-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D487-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C311-49
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D471-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D335-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D239-96
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D221-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D221-18 |
| filingDate |
2020-07-03^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ace3671f4e83432a5bd74adc0427be43
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3073866b46a488e83b6b70efd93b422
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8ee3c9bbc10bbcdf80c7d764460d081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_36c04d3ee5dda510cdee2e676388324d |
| publicationDate |
2021-02-18^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2021029158-A1 |
| titleOfInvention |
Sulfonamide compound, nonionic photoacid generator, and photolithography resin composition |
| abstract |
The purpose of the present invention is to provide: a sulfonamide compound which has a high decomposition rate in response to near-ultraviolet rays and which generates a superacid bis-sulfonamide, and which is highly soluble in a resist solvent; a photoacid generator containing the sulfonamide compound; and a photolithography resin composition which contains the photoacid generator and which has high sensitivity to near-ultraviolet rays. The present invention is a sulfonamide compound (A) characterized by being represented by general formula (1) or (2). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022030107-A1 |
| priorityDate |
2019-08-09^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |