| abstract |
A method for suppressing a biofilm, said method being characterized by irradiating ultrasonic waves having a frequency of from 20 kHz to 100 kHz within a plating tank, a recovery tank and a water washing tank, which are used for a wet plating device. The present invention addresses the problem of providing a method for suppressing the occurrence of a biofilm in a plating tank, a recovery tank and a water washing tank, said tanks being used in a wet plating process, without having adverse effects on a plating film. |