| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a2b51bafa4b785eff3d9cb6a78ca023a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2602-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D327-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
2022-06-16^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_715d1d53a6e876f2662ccdc9c33b128b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc1f9db1908781133e68483f109ff34c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d38fe84505757e152d889fa34602a183
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_603baeaa2e13b4ec1f0c02a8833213c2 |
| publicationDate |
2022-12-29^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2022272226-A1 |
| titleOfInvention |
Oxathianium ion-containing sulfonic acid derivative compound as photoacid generators in resist applications |
| abstract |
A sulfonic acid derivative compound represented by Formula (I): (Formula (I)), wherein R is a substituted or unsubstituted C1-C12 alkyl group; and Z is selected from the group consisting of a substituted or unsubstituted polycyclic C3-C30 cycloalkyl group, a substituted or unsubstituted monocyclic C3-C30 cycloalkyl group, and a substituted or unsubstituted C3-C30 monocyclic heteroalkyl group. Compounds and compositions disclosed herein are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications. |
| priorityDate |
2021-06-23^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |