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filingDate 1995-12-21^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_522dcc9ae8bf04672ff3b0cfc51b3341
publicationDate 1996-07-11^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-9620965-A1
titleOfInvention Metal ion reduction in novolak resins solution in pgmea
abstract The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a very low level of metal ions, utilizing treated chelated ion exchange resins to make the neutral ammonium salt or acid form. A method is also provided for producing photoresist composition having a very low level of metal ions from such novolak resins and for producing semiconductor devices using such photoresist compositions.
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priorityDate 1994-12-30^^<http://www.w3.org/2001/XMLSchema#date>
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