| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dc05229904be2987713acc8b41db7cd3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-151 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C1-835
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-835
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F18-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F16-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F26-06 |
| filingDate |
1997-09-26^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_daa127069d00dc3a58e0e3cbd5fda64a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7fb8dce373aaf822af6000918e52ecf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2167d478eb265393e697f71adec8461b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9983e4b348d0f77b83a885eef9c0936
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_618088d26a21238ed20909a17a00a149
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9642f9d8f9fdf8da34bc80fdebdb1408
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_32eef90db69c65cedc54d843c1c655c6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0cf1c125725e3a989c6ea3042d479fa1 |
| publicationDate |
1998-04-09^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-9814834-A1 |
| titleOfInvention |
Antireflective coating for photoresist compositions |
| abstract |
The present invention relates to a novel antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and an organic solvent or a mixture of organic solvents, where the novel polymer comprises a unit containing a dye that absorbs from about 180nm to about 450nm and a unit containing a crosslinking group. |
| priorityDate |
1996-09-30^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |