http://rdf.ncbi.nlm.nih.gov/pubchem/reference/14182510

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contentType Journal Article
issn 1996-1944
issueIdentifier 4
pageRange 577-
publicationName Materials (Basel, Switzerland)
startingPage 577
bibliographicCitation Sun L, Shao T, Shi Z, Huang J, Ye X, Jiang X, Wu W, Yang L, Zheng W. Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process. Materials (Basel). 2018 Apr 10;11(4). PMID: 29642571; PMCID: PMC5951461.
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date 2018-04-10^^<http://www.w3.org/2001/XMLSchema#date>
identifier https://pubmed.ncbi.nlm.nih.gov/29642571
https://doi.org/10.3390/ma11040577
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language English
source https://www.crossref.org/
https://pubmed.ncbi.nlm.nih.gov/
title Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process

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