http://rdf.ncbi.nlm.nih.gov/pubchem/reference/1988428

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bibliographicCitation Sio HC, Kang D, Liu R, Stuckelberger J, Samundsett C, Macdonald D. Fluorine Passivation of Defects and Interfaces in Crystalline Silicon. ACS Appl Mater Interfaces. 2021 Jul 14;13(27):32503–9. doi: 10.1021/acsami.1c07221. PMID: 34191501.
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title Fluorine Passivation of Defects and Interfaces in Crystalline Silicon
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